NanoSeeX XRCD Technology Presented at SPIE Photonics West 2025

NanoSeeX XRCD Technology Presented at SPIE Photonics West 2025

NanoSeeX announced that its advanced X-ray critical dimension metrology technology, XRCD, was presented as an invited paper at SPIE Photonics West 2025.

The paper, titled “A novel critical dimension metrology by conducting soft x-ray technique for advanced semiconductor manufacturing,” introduces a new tool based metrology approach using soft X-ray reflection and scattering to measure critical dimensions of nanoscale semiconductor structures on 300 mm wafers.

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