Products for metrology

NanoSeeX Advanced X-Ray Metrology Systems

Innovating Precision Measurement for Semiconductor Manufacturing
X-ray Reflection Critical Dimension Tool (XRCD)

FactSheet

B E N E F I T S

The NanoSeeX X-Ray metrology systems are designed to provide exceptional precision and accuracy for advanced designed structures measurements, enabling manufacturers to:

  • Streamline R&D and production cycle times with accurate characterization and optimization of advanced 3D transistors, photonics, and other advanced structures
  • Meet stringent quality and precision requirements for semiconductor and optical device manufacturing
  • Gain reliable, actionable data on single-layer and multi-layer thin films for advanced material analysis
  • Enhance yield and process control at optimal cost-of-ownership

T E C H N O L O G I E S

  • Reflective X-Ray technology for non-destructive material analysis
  • Advanced algorithms for 3D transistors, multi-layer and single-layer thin-film characterization
  • High sensitivity and repeatability for sub-nanometer layer thickness & CDs measurements
  • Flexible system configurations to meet both automated and semi-automated workflows

A P P L I C A T I O N S

  • Measurement of advanced logic node devices
  • Advanced photonics material characterization and debugging
  • Inline monitoring and evaluation of critical sites for process stability
  • Process window exploration and qualification for semiconductor production

P L A T F O R M  O P T I O N S

•  Measurement System Specifications:

  • Fully automated with EFEM for seamless wafer handling
  • Semi-automated with manual load-lock operation
  • Coupon, Wafer Sizes: 4-inches, 6-inches, 8-inches, 12-inches

•  Measurement Capability:

  • Absorptive materials: ≤ 3 μm
  • Non-absorptive materials: ≤ 6 μm
  • Metal layers: ≤ 5 μm
  • Micro-Area Measurement

•  Performance:

  • Precision: ≤ 1 nm for both film thickness & CDs
  • Accuracy: ≤ 2 nm for film thickness, ≤ 1 nm for CDs

•   Customizable Configuration System

M A R K E T

Semiconductor manufacturing and photonics industries, focusing on advanced design nodes (including EUV Mask & Pellicles) and optical devices.